Multibeam

We provide chipmakers with what they need – hardware, software and services – to produce patterns on silicon through direct-write lithography. Headquartered in Santa Clara, California, Multibeam engages in the design, manufacture, and sales of multi-column electron-beam lithography (MEBL) systems that enable maskless production of integrated circuits (ICs) with on-chip security, rapid prototyping, heterogeneous chiplet integration, silicon photonics, and other emerging applications. At the heart of Multibeam technology is an array of miniature e-beam columns that provide a maskless and high-throughput platform for writing nanoscale IC patterns seamlessly across full wafers. Multibeam will present High-productivity maskless patterning at the deep submicron scale: An overview of Multibeam’s multicolumn e-beam lithography system at the 2024 SPIE Advanced Litho + Patterning conference.